Physical Vapour Deposition (PVD) Seminar: Part 2
Event to be held on Tuesday, April 1, 2025, 10:00 AM – 2:30 PM, QNC 0101.
Building upon the knowledge from the Physical Vapour Deposition (PVD) Introductory Seminar – which introduced film growth techniques and potential applications – the Quantum – Nano Fabrication and Characterization Facility (QNFCF) and Transformative Quantum Technologies (TQT) will be hosting PVD Seminar: Part 2. This event will expand on the materials covered in the first seminar. We will be joined by Mike Miller (Angstrom Engineering) who will be further exploring properties of thin films, process parameters and associated effects, statistical process control, and surface analysis techniques.
Attendance of the PVD Introductory Seminar is not necessary. This seminar assumes a basic knowledge of vacuum systems and PVD techniques such as thermal/E-beam evaporation and magnetron sputtering.
Topical Outline*
- Mechanical, electrical, and optical properties of thin films
- Process parameters that affect film properties
- Gauge and instrument calibration
- Properties of substrate surfaces
- Measurement of film thickness and stress
- Detection of contamination
- Introduction to surface analysis techniques
- Substrate preparation and cleaning
- Statistical Process Control (SPC)
- Problem-solving within organizational structures
* Topics are subject to change.
Lunch will be provided. We hope you will join us. Please register for the event below.