Physical Vapour Deposition (PVD) Introductory Seminar
Event to be held on Wednesday, January 29, 2025, 10:00 AM – 2:30 PM, QNC 0101.
Physical vapour deposition (PVD) is an important category of film growth techniques for quantum, nanotechnology, and semiconductor devices. The Quantum Nano Fabrication and Characterization Facility (QNFCF) houses a wide variety of PVD tools to serve the needs of a diverse community of researchers. With so many options for PVD tools, techniques, and process setpoints, how does one choose the right path of investigation and process development for their specific device?
To help answer this question, QNFCF and Transformative Quantum Technologies (TQT) will be hosting an introductory seminar on vacuum systems and PVD film deposition techniques. We will be joined by Mike Miller (Angstrom Engineering), who will be providing an introduction to PVD and vacuum coating sciences, as well as delving into topics such as PVD source selection, mechanical, electrical, and optical properties of thin films, and process parameters that affect film properties.
No prior knowledge of physical vapour deposition is required.
Topical outline:
- Introduction to PVD and vacuum-coating science
- PVD source selection – mechanism of operation; benefits and limitations
- High vacuum pumps – mechanism of operation; benefits and limitations
- Gas flow and pressure management
- Substrate fixturing – motion, heating/cooling, ion/bias assistance
- Mechanical, electrical, and optical properties of thin films
- Process parameters that affect film properties
* Topics are subject to change.
Lunch will be provided. We hope you will join us. Please register for the event below.